Paul C. McIntyre

Title: Professor
Department(s):Materials Science and Engineering
Affiliation(s):Senior Fellow, Precourt Institute
Location:McCullough Building, Rm. 362
476 Lomita Mall
Stanford, CA 94305
Mail Code:4045
Administrator:Sybille Katz

The McIntyre Group is affiliated with the Department of Materials Science and Engineering, the Geballe Laboratory for Advanced Materials, and the Precourt Institute for Energy at Stanford University. We perform basic research on nanostructured inorganic materials for applications in electronics and energy technologies. Major themes of our research are:

1) Structure and properties of interfaces between dissimilar materials (especially metal oxide/covalent semiconductor interfaces);
2) Atomic layer deposition of ultrathin films and their applications; and
3) Crystal growth at the nanoscale.

With collaborators both here at Stanford and at institutions worldwide, we synthesize materials, characterize their structures and compositions using a variety of advanced microscopies and spectroscopies, study the formation and passivation of defects, and measure functional properties of devices. Our research is supported by several U.S. government agencies and by major industrial consortia and corporations.


(1) Interface Structure and Properties
We are engaged in studies of interfaces that form between deposited metal oxides and various high-quality covalent semiconductor crystals, including Si, Ge, InGaAs and GaN. Most of this work is motivated by the continued dimensional scaling of field effect transistors, which prompts interest in new high permittivity dielectric materials and new semiconductors for the transistor channel. Making interfaces with low areal densities of electronic carrier traps is essential for efficient operation of such devices. Our group studies the role of deposition conditions, process chemistry, post-deposition annealing on the stability of these oxide/semiconductor interfaces, and the defects they form. We also investigate methods for protecting semiconductor surfaces during metal oxide deposition and for post-deposition passivation of interface defects.

(2) Applications of Atomic Layer Deposition
Atomic layer deposition (ALD), a method of surface adsorption-limited chemical vapor deposition, is renowned for its ability to deposit ultra-thin and pin-hole free films on a wide variety of substrates. We are investigating applications of ALD in solid oxide fuel cell membranes (e.g. Y2O3-ZrO2 alloy films), ultra-high permittivity dielectrics (e.g. SrTiO3 multi-cation oxides), and in protection of semiconductors from harsh electrochemical environments (e.g. TiO2 on n-Si photoanodes for solar water splitting). An important theme in this work is to exploit and investigate possible changes in the functional properties of these oxide layers as their thicknesses reach nanoscopic dimensions.

(3) Nanoscale Crystal Growth
We are engaged in studies of nanoscale crystal growth, with particular attention give to Group IV nanowires (NWs), such as Ge NWs and Ge-core/Si-shell NWs. These unique, molecular-scale structures exhibit fascinating electronic and photonic properties, and can be synthesized under conditions that are compatible with silicon device fabrication. Our research focuses on deep sub-eutectic vapor-liquid-solid (VLS) growth of Ge nanowires, the mechanisms and inhibition of misfit strain relaxation in large-mismatch Ge-core/Si shell nanowires, and kinking during VLS growth of NWs. In collaboration with others, we use photoluminescence and time-resolved reflectivity measurements to probe the effects of nanowire diameter, strain and surface defect passivation on electronic structure.

Sponsors and Affiliate Support

  • NSF Chemical, Bioengineering, Environmental, and Transport Systems
  • DOE Bay Area Photovoltaics Consortium
  • SRC/GRC Device Sciences
  • SRC Non-Classical CMOS Center
  • NSF Division of Materials Research
  • Israel-US Binational Science Foundation
  • Stanford Global Climate and Energy Project
  • Stanford Initiative in Nanoscale Materials and Processes
  • Applied Materials Custom Research Support

  • Department of Materials Science and Engineering, Stanford University

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