Center for Magnetic Nanotechnology






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Nanomagnetics Facility


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Nanomagnetics Facility

The Nanomagnetics Facility in the Stanford Center for Magnetic Nanotechnology provides processing and chacterization capabilities for magnetic and other novel materials.  The Nanomagnetics Facility includes:

·   An AJA UHV sputtering chamber with 8 targets and load lock for sample tansfers. It can accommodate substrates ranging from pieces to 8" diameter (Figure 1).   

·   A noncontact robotic spotter for biochip fabrication (Figure 2).   

·   >8 biochip reader stations (Figure 3).   

·   A “Cluster” UHV system for in situ vacuum deposition of a variety of films from targets comprised of a dozen different materials, with thickness control to the 0.1 nanometer level (Figure 4).  Novel composite materials can be formed by co-deposition from multiple targets or in the presence of a reactive gas, thus presenting a vast range of combinatorial possibilities. 

·   Ion milling with 7" RF Source (Figure 5), a powerful tool for selectively removing a broad range of materials patterned substrates.

·  Obducat nanoimprint system, which has demonstrated production of dense templates with features down to 30 nm lateral dimensions.  (Figure 6 & 7)

·   Alternating Gradient Magnetometer (AGM), M-H Loop Tracer (MESA from SHB Instruments), and Vibrating Sample Magnetometer (VSM).

·   High frequency permeameter (Ryowa).

·   Kerr microscope made by Evico for magnetic domain imaging and local M-H loops. (Figure 8)

·  Three custom-made probe stations for DC and high frequency applications

·  High resolution Atomic Force Microscopy (with  conducting tips capable of 0.1 pA current resolution) and Magnetic Force Microscopy.

·  Perkin Elmer 4400 Deposition System (4 targets), Ion Tech Deposition System (1 target, dual beam, Figure 9), and a UHV chamber with 4 ion beam targets and 3 DC magnetron targets.

  We also have access to the Stanford Nanofabrication Facility (SNF), which is a 10,000 square foot, Class 100 cleanroom housing a complete suite of over 75 processing tools for the micro- and nano- fabrication of devices.  SNF, in partnership with twelve other university facilities across the country, form NSF’s National Nanotechnology Infrastructure Network (NNIN), which is committed to providing nanofabrication resources to researchers across the country, in industry as well as academia. Furthermore, the newly established Stanford Nanocharacterization Laboratory (SNL) provides services in high resolution SEM, TEM, FIB, X-ray diffraction, XPS, EDAX, microprobe and much more. Stanford Synchrotron Radiation Lab (SSRL) has long standing strengths in grazing incidence x-ray scattering, ultraviolet photoemission, X-Ray Magnetic Circular Dichroism (XMCD), and photoelectron emission microscopy (PEEM).



Figure 1. AJA 8-target, UHV deposition

chamber for nanostructed multilayers

with up to 8" wafers


Figure 2: Nonconract robotic spotter for

biochip fabrication


Figure 3: Biochip reader stations: benchtop

version (top) and handheld version (bottom).


Figure 4: Multichamber, multi-target,"cluster"

UHV deposition.


Figure 5: Ion milling system.


Figure 6: Obducat nanoimprinter.


Figure 7: SEM of large field 50 nm features.


Figure 8: Kerr-effect microscope images of

magnetic domains in CoFeHfO of various

thicknesses (0.4, 0.8, and 4 um, respectively).


Figure 9: Ion Tech dual-beam deposition chamber.















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