||Center for Magnetic Nanotechnology|
The Nanomagnetics Facility in the Stanford Center for
Magnetic Nanotechnology provides processing and chacterization capabilities for magnetic and
other novel materials. The
Nanomagnetics Facility includes:
· An AJA UHV sputtering chamber with 8 targets and load lock for sample tansfers. It can accommodate substrates ranging from pieces to 8" diameter (Figure 1).
· A noncontact robotic spotter for biochip fabrication (Figure 2).
· >8 biochip reader stations (Figure 3).
system for in situ vacuum
deposition of a variety of films from targets comprised of a dozen
different materials, with thickness control to the 0.1 nanometer level
(Figure 4). Novel
composite materials can be formed by co-deposition from multiple targets
or in the presence of a reactive gas, thus presenting a vast range of
· Ion milling with 7" RF Source (Figure 5), a powerful tool for selectively removing a broad range of materials patterned substrates.
· Obducat nanoimprint system, which has
demonstrated production of dense templates with features down to 30 nm
(Figure 6 & 7)
(Figure 6 & 7)
Alternating Gradient Magnetometer (AGM), M-H
Loop Tracer (MESA from SHB Instruments), and Vibrating Sample
High frequency permeameter (Ryowa).
microscope made by Evico for magnetic domain imaging and local M-H loops.
custom-made probe stations for DC and high frequency applications
High resolution Atomic Force Microscopy (with
conducting tips capable of 0.1 pA current resolution) and Magnetic
· Perkin Elmer 4400 Deposition System (4 targets), Ion Tech Deposition System (1 target, dual beam, Figure 9), and a UHV chamber with 4 ion beam targets and 3 DC magnetron targets.
Figure 1. AJA 8-target, UHV deposition
chamber for nanostructed multilayers
with up to 8" wafers
Figure 2: Nonconract robotic spotter for
Figure 3: Biochip reader stations: benchtop
version (top) and handheld version (bottom).
Figure 4: Multichamber, multi-target,"cluster"
Figure 5: Ion milling system.
Figure 6: Obducat
nanoimprinter. Figure 7: SEM of large field 50 nm features. Figure
8: Kerr-effect microscope images of magnetic domains in CoFeHfO of various
thicknesses (0.4, 0.8, and 4 um, respectively). Figure 9: Ion Tech
dual-beam deposition chamber.
Figure 6: Obducat nanoimprinter.
Figure 7: SEM of large field 50 nm features.
Figure 8: Kerr-effect microscope images of
magnetic domains in CoFeHfO of various
thicknesses (0.4, 0.8, and 4 um, respectively).
Figure 9: Ion Tech dual-beam deposition chamber.
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