% Sb concentration profile after ion implantation

x = linspace(0,100);

Cp = 3.03e21; % in cm^-3
Rp = 40; % in nm
delRp = 7.5; % in nm
C = Cp*exp(-(x-Rp).^2/(2*delRp^2));

semilogy(x,C);

xlabel('Distance into wafer (in nm)');
ylabel('Sb concentration (in cm^{-3})');
title('6.152 PS3, Problem 3b');
