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HEPL Seminar

Patrick Naulleau, PhD
Senajith (Seno) Rekawa
Arnaud Allezy, PhD

Lawrence Berkeley National Laboratory's Center for X-ray Optics (CXRO)

Vibration mitigation challenges in modern Extreme Ultraviolet tools for semiconductor Applications

Abstract: Lawrence Berkeley National Laboratory's Center for X-ray Optics (CXRO) works to further science and technology using short wavelength optical systems and techniques. Since the early 2000s, CXRO has worked with semiconductor companies to develop the infrastructure needed for world-leading research and development in the field of EUVL, contributing basic research and development essential to the health of the U.S. industry as a whole before individual firms enter competition.

Two new Extreme Ultraviolet endstations currently designed at CXRO will be presented:

  • MET5 will be a unique instrument with twice the effective resolution of the best tools now in commercial use. MET5 and the new wafer-processing facility will allow the development and test of photosensitive materials capable of transferring patterns on the nanoscale,
  • SHARP will be the world’s most advanced extreme-ultraviolet (EUV) microscope, it will be dedicated to photolithography, the central process in the creation of computer chips.
  • The stability of those new systems in the projected vibration environment is a challenge. CXRO has experience with vibration mitigation techniques on its current endstations and the status of our investigations on the general strategy of vibration mitigation will be developed.


    Bios: Patrick Naulleau, PhD
    Patrick is the Director of the Center for X-ray Optics at Lawrence Berkeley Laboratory and the Principle Investigator for the Center’s industry funded EUV Lithography program. Patrick is also a member of the UC Berkeley IMPACT program focused on advanced semiconductor technology. Between 2005 and 2008, he served as an Associate Professor and Senior Research Scientist at the University of Albany, SUNY, where he led EUV activities in the $600 million INVENT consortium program, among other research in nanolithography and nanometrology systems, methods and applications.

    Senajith (Seno) Rekawa
    Seno is a mechanical engineer and the Engineering Group Leader of the Center for X-ray Optics. Seno is also Nominating Committee Chair-Elect of the American Society for Precision Engineering. During 16 years at the Center for X-ray Optics, he worked closely with the scientists to create high-performance experimental systems for every project, from shield wall to end-station, from project planning to commissioning.

    Arnaud Allezy, PhD
    Arnaud is a mechanical engineer with a particular interest in understanding vibration dynamics of complex devices as well as designing and developing experimental set-up to validate models. Arnaud joined the Center for X-ray Optics in 2010. He is in charge of providing support with regards to managing the vibration response of new extreme ultraviolet microscopes and lithography tools for semiconductor applications. Arnaud previously worked for two years at Thales Alenia Space France, as a mechanical engineer involved in deployable structures for space applications, and vibration isolation strategies for observation satellites.

    Location: Physics/Astrophysics Building, Conference Rooms 102 & 103
    Wednesday, May 2, 2012, 4:15 to 5:30pm
    Light refreshments will be available at 4pm; Presentation begins 4:15am.  Open to All



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