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2019

  1. Rituraj, P. B. Catrysse, and S. Fan, "Scattering of electromagnetic waves by a cylinder inside a uniaxial hyperbolic medium," Proc. SPIE Int. Soc. Opt. Eng. 11080, 1108067, 2019.

2018

  1. A. Y. Song, P. B. Catrysse, and S. Fan, "Broadband control of topological nodes in electromagnetic fields," Proc. CLEO ’18, FTu3E.7, 2018.
  2. Y. Büyükalp, P. B. Catrysse, W. Shin, and S. Fan,"Spectral and polarimetric light-sorting with a wide-angle snapshot subwavelength-size device," Proc. SPIE Int. Soc. Opt. Eng. 10541, 1054145, 2018.

2016

  1. P. B. Catrysse, A. Y. Song, and S. Fan, "Photonic structure textile design for Localized Thermal Management via radiative cooling," Proc. CLEO ’16, FTh3B.4 (2016)

2015

  1. Y. Büyükalp, P. B. Catrysse, W. Shin, and S. Fan, "Spectral Light Separator: The subwavelength-size device to spectrally decompose light in an efficient way," OSA FiO Tech. Digest ’15, FM1B, 2015.
  2. (Invited) P. B. Catrysse and S. Fan, "Infinite anisotropy : An approach to manipulating deep sub-wavelength optical beams," Proc. META Conferences ’15, 2015.
  3. (Invited) P. B. Catrysse, "Integration of optical functionality for image sensing through sub-wavelength geometry design," Proc. SPIE Int. Soc. Opt. Eng. 9481, 94811, 2015.
  4. (Invited) P. B. Catrysse, "Routing of deep-subwavelength optical beams without reflection and diffraction using infinitely anisotropic metamaterials," Proc. SPIE Int. Soc. Opt. Eng. 9361, 936137, 2015.

2014

  1. P. B. Catrysse, V. Liu and S. Fan, "Large-scale ideal waveguide lenses with complete power concentration in a single waveguide," Proc. CLEO ’14, FW3K.7, 2014.
  2. (Invited) P. B. Catrysse, "Nanophotonics and metamaterials for solid-state imaging," Proc. Int. Congress of Imaging Science ’14, 59, 2014.

2013

  1. W. Shin, W. Cai, P. B. Catrysse, G. Veronis, M. Brongersma, S. Fan, "Plasmonic nano-coaxial waveguides for 90-degree bends and T-splitters," Proc. CLEO:QELS ’13, QW3N.5, 2013.
  2. P. B. Catrysse and S. Fan, "Routing of deep-subwavelength optical beams without reflection and diffraction using infinitely anisotropic metamaterials," Proc. ICCES ’13, A05, 2013.

2012

  1. (Best Score Paper) P. B. Catrysse and T. Skauli, "Pixel scaling in infrared focal plane arrays," Proc. OSA Optics & Photonics Congress on Imaging Systems (IS) '12, 2012.
  2. P. B. Catrysse and S. Fan, "Deep sub-wavelength beam propagation, beam manipulation and imaging with extreme anisotropic meta-materials," Proc. QELS ’12, QTu1G.7, 2012.
  3. L. Verslegers, Z. Yu, Z. Ruan, P. B. Catrysse, and S. Fan, "From electromagnetically induced transparency to superscattering with a single structure: a coupled-mode theory for doubly resonant structures," Proc. SPIE Int. Soc. Opt. Eng. 8269, 82690X, 2012.

2011

  1. P. B. Catrysse and S. Fan, "Transverse electromagnetic modes in aperture waveguides containing a metamaterial with extreme anisotropy," OSA FiO Tech. Digest ’11, FMI7, 2011.
  2. L. Verslegers, Z. Yu, P. B. Catrysse, and S. Fan, "Temporal coupled-mode theory for resonant apertures," Proc. QELS ’11, QThC11, 2011.
  3. P. B. Catrysse and S. Fan, "Transverse electro-magnetic modes in apertures filled with an extreme anisotropic meta-material," Proc. QELS ’11, QThP2, 2011.

2010

  1. L. Verslegers, Z. Yu, P. B. Catrysse, and S. Fan, "Temporal coupled-mode theory for resonant apertures," Mater. Res. Soc. Symp. Proc., M7.4, 2010.
  2. P. B. Catrysse and S. Fan, "Transparent electrode designs based on optimal nano-patterning of metallic films," Proc. SPIE Int. Soc. Opt. Eng. 7757, 775773, 2010.
  3. (Invited) P. B. Catrysse, "Nanophotonics for CMOS image sensors," Proc. OSA Optics & Photonics Congress on Imaging Systems (IS) '10, 2010.
  4. J. Farrell, P. B. Catrysse, and B. A Wandell, "The digital camera is an imaging system," Proc. OSA Optics & Photonics Congress on Imaging Systems (IS) '10, 2010.
  5. L. Verslegers, P. B. Catrysse, Z. Yu, W. Shin, Z. Ruan, and S. Fan, "Phase front design with metallic pillar arrays," Proc. QELS ’10, QThH4, 2010.
  6. P. B. Catrysse and S. Fan, "Optimizing nano-patterned metal films for use as transparent electrodes in optoelectronic devices," Proc. QELS ’10, QMB4, 2010.
  7. L. Verslegers, P. B. Catrysse, Z. Yu, and S. Fan, "Deep-subwavelength focusing and steering of light in an aperiodic metallic waveguide array," Proc. SPIE Int. Soc. Opt. Eng. 7604, 760423, 2010. (Cited 118 times)
  8. G. Leseur, N. Meunier, G. Georgiadis, L. Huang, P. B. Catrysse, B. A. Wandell and J. M. DiCarlo, "High-speed document sensing and imaging in digital presses," Proc. SPIE Int. Soc. Opt. Eng. 7536, 753609, 2010.

2009

  1. (Invited) S. Fan, Z. Yu, L. Verslegers, and P. B. Catrysse, "Integrated nanophotonics: Dynamic optical isolation, and nanoscale far-field focusing in aperiodic plasmonic waveguide array," Proc. IEEE Photonics Society Annual Meeting '09, 646, 2009.
  2. L. Verslegers, P. B. Catrysse, Z. Yu, J. S. White, E. S. Barnard, M. L. Brongersma, and S. Fan, "Nanoscale slit arrays as planar far-field lenses," Proc. SPIE Int. Soc. Opt. Eng. 7394, 73940B, 2009.
  3. P. B. Catrysse and S. Fan, "Simple analytical expression for the dispersion of plasmonic structures with coaxial geometry," Proc. IQEC ’09, IFC5, 2009.
  4. L. Verslegers, P. B. Catrysse, Z. Yu, J. S. White, E. S. Barnard, M. L. Brongersma, and S. Fan, "Planar lenses based on nanoscale slit arrays in a metallic film," Proc. CLEO-IQEC ’09, JWE2, 2009.
  5. F. Xiao, J. Farell, P. B. Catrysse, and B. Wandell, "Mobile Imaging: The big challenge of the small pixel," Proc. SPIE Int. Soc. Opt. Eng. 7250, 72500K, 2009. (Cited 48 times)
  6. C. C. Fesenmaier, Y. Huo, and P. B. Catrysse, "Effects of imaging lens f-number on sub-2 μm CMOS image sensor pixel performance," Proc. SPIE Int. Soc. Opt. Eng. 7250, 72500G, 2009.
  7. (Best Score Paper) Y. Huo, C. C. Fesenmaier, and P. B. Catrysse, "Microlens performance limits in sub-2 μm pixel CMOS image sensors," Proc. SPIE Int. Soc. Opt. Eng. 7250, 725005, 2009.

2008

  1. P. B. Catrysse and S. Fan, "Deep-subwavelength cylindrical waveguides with extremely low cutoff frequency," Proc. IEEE/LEOS Lasers and Electro-Optics Society Annual Meeting ’08, 208, 2008.
  2. P. B. Catrysse and S. Fan, "Deep-subwavelength coaxial waveguides with a hollow core," Proc. QELS ’08, QWA2, 2008.
  3. (Best Score Paper) C. C. Fesenmaier and P. B. Catrysse, "Mitigation of Pixel Scaling Effects in CMOS Image Sensors," Proc. SPIE Int. Soc. Opt. Eng. 6817, 681704, 2008.

2007

  1. P. B. Catrysse and S. Fan, "Enlarging the bandwidth of nano-scale propagating plasmonic modes in deep-subwavelength cylindrical holes," Mater. Res. Soc. Symp. Proc., GG9.6, 2007.
  2. J Provine, P. B. Catrysse, C. Roper, R. Maboudian, S. Fan, and R. T. Howe, "Phonon polariton reflectance spectra in a silicon carbide membrane hole array," IEEE/LEOS Lasers and Electro-Optics Society Annual Meeting '07, 466, 2007.
  3. P. B. Catrysse and S. Fan, "Propagating modes with large bandwidth in nanoscale cylindrical holes," OSA Tech. Digest '07, FThR4, 2007.
  4. J Provine, P. B. Catrysse, C. Roper, R. Maboudian, S. Fan, and R. T. Howe, "Extraordinary transmission through a poly-SiC membrane with subwavelength hole arrays," IEEE/LEOS International Conference on Optical MEMS and Nanophotonics '07, 157, 2007. [pdf]
    Abstract: We report on the experimental observation of the effect of periodic hole arrays in the infrared reflection spectra of suspended polycrystalline silicon carbide (poly-SiC) membranes. The poly-SiC was deposited by low pressure chemical vapor deposition (LPCVD), patterned with contact photolithography, and etched by reactive ion etching (RIE). The spectra are shown to be strongly dependent on the pitch and aperture size of the hole arrays, indicating poly-SiC has promise as a mid-IR optical material. [pdf]
  5. P. B. Catrysse and S. Fan, "Transmission enhancement and suppression by subwavelength hole arrays in polaritonic films," Proc. SPIE Int. Soc. Opt. Eng. 6480, 64800C, 2007.

2006

  1. P. B. Catrysse and S. Fan, "High transmission through subwavelength cylindrical hole arrays in polaritonic thin films," Proc. QELS ’06, 2006.
  2. P. B. Catrysse and S. Fan, "Plasmonic films with a periodic arrangement of sub-wavelength slits," Proc. SPIE Int. Soc. Opt. Eng. 6128, 612818, 2006.
  3. B. Rodricks, K. Venkataraman, P. B. Catrysse, B. Wandell, "Optical interaction of space and wavelength in high resolution digital imagers," Proc. SPIE Int. Soc. Opt. Eng. 6069, 04, 2006.

2005

  1. P. B. Catrysse, H. Shin, and S. Fan, "The effect of propagating modes on the transmission properties of sub-wavelength cylindrical holes," Proc. Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication 49, 212-213, 2005. (Cited 40 times)
  2. (Invited) S. Fan, H. Shin, M. Brongersma, G. Veronis, J.-T. Shen, and P. B. Catrysse, "Sub-wavelength resonances in metal-dielectric metal plasmonic structures," IEEE LEOS '05, 521, 2005.
  3. P. B. Catrysse, J.-T. Shen, G. Veronis, H. Shin, and S. Fan, "Waveguides based on high refractive index metamaterials," OSA Tech. Digest '05, FMA2, 2005.
  4. (Invited) S. Fan, M. F. Yanik, Z. Wang, W. J. Suh, J.T. Shen, and P. B. Catrysse, "Nanophotonics: Stopping Light, Nonreciprocity, and Metamaterials," Proc. CLEO ’05, 1022-1023, 2005.
  5. (Invited) P. B. Catrysse, "Monolithic integration of electronics and sub-wavelength metal optics in deep submicron CMOS technology" Mater. Res. Soc. Symp. Proc. 869, D1.5, 2005. [pdf]
    Abstract: The structures that can be implemented and the materials that are used in complementary metal-oxide semiconductor (CMOS) integrated circuit (IC) technology are optimized for electronic performance. However, they are also suitable for manipulating and detecting optical signals. In this paper, we show that while CMOS scaling trends are motivated by improved electronic performance, they are also creating new opportunities for controlling and detecting optical signals at the nanometer scale. For example, in 90-nm CMOS technology the minimum feature size of metal interconnects reaches below 100 nm. This enables the design of nano-slits and nano-apertures that allow control of optical signals at sub-wavelength dimensions. The ability to engineer materials at the nanoscale even holds the promise of creating meta-materials with optical properties, which are unlike those found in the world around us. As an early example of the monolithic integration of electronics and sub-wavelength metal optics, we focus on integrated color pixels (ICPs), a novel color architecture for CMOS image sensors. Following the trend of increased integration in the field of CMOS image sensors, we recently integrated color-filtering capabilities inside image sensor pixels. Specifically, we demonstrated wavelength selectivity of sub-wavelength patterned metal layers in a 180-nm CMOS technology. To fulfill the promise of monolithic photonic integration and to design useful nanophotonic components, such as those employed in ICPs, we argue that analytical models capturing the underlying physical mechanisms of light-matter interaction are of utmost importance. [pdf]
  6. P. B. Catrysse and B. A. Wandell, "Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld," Proc. SPIE Int. Soc. Opt. Eng. 5678, 1, 2005. (Cited 66 times) [pdf]
    Abstract: The steady increase in CMOS imager pixel count is built on the technology advances summarized as Moore’s law. Because imagers must interact with light, Moore’s Law impact differs from its impact on other integrated circuit applications. In this paper, we investigate how the trend towards smaller pixels interacts with two fundamental properties of light: photon noise and diffraction. Using simulations, we investigate three consequences of decreasing pixel size on image quality. First, we quantify the likelihood that photon noise will become visible and derive a noise visibility contour map based on photometric exposure and pixel size. Second, we illustrate the consequence of diffraction and optical imperfections on image quality and analyze the implications of decreasing pixel size for aliasing in monochrome and color sensors. Third, we calculate how decreasing pixel size impacts the effective use of microlens arrays and derive curves for the concentration and redirection of light within the pixel. [pdf]
  7. P. Y. Maeda, P. B. Catrysse and B. A. Wandell, "Integrating lens design with digital camera simulation," Proc. SPIE Int. Soc. Opt. Eng. 5678, 48, 2005. (Cited 45 times)

2004

  1. (Invited) P. B. Catrysse, M. L. Brongersma, and S. Fan, "Subwavelength optics with materials and material structures manufactured in deep submicron CMOS technology," Mater. Res. Soc. Symp. Proc. 817, L5.5, 2004.
  2. R. Zia, P. B. Catrysse, and M. L. Brongersma, "Photon scanning tunneling for surface plasmon excitation and characterization," Mater. Res. Soc. Symp. Proc. 817, L3.5, 2004.
  3. (Invited) M. Bordovsky, P. Catrysse, S. Dods, M. Freitas, J. Klein, L. Kotacka, V. Tzolov, I. Uzunov, J. Zhang, "Waveguide design, modeling, and optimization: from photonic nano-devices to integrated photonic circuits," Proc. SPIE Int. Soc. Opt. Eng. 5355, 65, 2004.
    (Selected for an invited article in the Software and Computing department of Laser Focus World Vol. 40, No. 7, 2004)
  4. J. Farrell, F. Xiao, P. B. Catrysse, B. A. Wandell, "A simulation tool for evaluating digital camera image quality," Proc. SPIE Int. Soc. Opt. Eng. 5294, 124, 2004. (Cited 134 times)

2002

  1. F. Xiao, J. M. DiCarlo, P. B. Catrysse, and B. A. Wandell, "High Dynamic Range Imaging of Natural Scenes," Color Science and Engineering - Systems, Technologies and Applications 10, 337, 2002. (Cited 61 times)

2001

  1. (Best Paper Award Finalist) P. B. Catrysse, B. A. Wandell, and A. El Gamal, "An Integrated Color Pixel in 0.18µm CMOS technology," 2001 International Electron Devices Meeting - Technical Digest, 559, 2001. (Cited 26 times) [pdf]
    Abstract: A method for controlling photodetector wavelength responsivity via metal layer patterns is demonstrated in a standard 0.18-μm CMOS technology. Responsivities suitable for RGB integrated color pixels, peaking at 450 nm, 575 nm and 750 nm, are measured. Over 100% uncovered area transmittances are measured. We discuss possible theoretical explanations for the observed high transmittance. [pdf]
    (One of 204 accepted papers out of 595 submitted abstracts. Finalist of Best Student Paper Award)
  2. F. Xiao, P. B. Catrysse, J. M. DiCarlo, and B. A. Wandell, "Time-domain color image acquisition using modulated light sources," Proc. SPIE Int. Soc. Opt. Eng. 4306, 22, 2001.

2000

  1. J. D. Mansell, P. B. Catrysse, E. K. Gustafson, and R. L. Byer, "Silicon Deformable Mirrors and CMOS-based Wavefront Sensors," Proc. SPIE Int. Soc. Opt. Eng. 4124, 15, 2000. (Cited 23 times)
  2. P. B. Catrysse, X. Liu, and A. El Gamal, "Quantum efficiency reduction due to pixel vignetting in CMOS image sensors," Proc. SPIE Int. Soc. Opt. Eng. 3965, 420, 2000. (Cited 55 times) [pdf]
    Abstract: CMOS image sensor designers take advantage of technology scaling either by reducing pixel size or by adding more transistors to the pixel. In both cases, the distance from the chip surface to the photodiode increases relative to the photodiode planar dimensions. As a result, light must travel through an increasingly deeper and narrower "tunnel" before it reaches the photodiode. This is especially problematic for light incident at oblique angles; the narrow tunnel walls cast a shadow on the photodiode, which in turn severely reduces its effective QE. We refer to this phenomenon as pixel vignetting. The paper presents experimental results from a 640 x 512 CMOS image sensor fabricated using a O.35-μm 4-layer metal CMOS process that shows significant QE reduction of up to 50% for off-axis relative to on-axis pixels. Using simple geometric models of the sensor and the imaging optics, we compare the QE for on and off-axis pixels. We find that our analysis results support the hypothesis that the experimentally observed QE reduction is indeed due to pixel vignetting. We show that pixel vignetting becomes more severe as CMOS technology scales, even for a 2-layer metal APS pixel. Finally, we briefly discuss several potential solutions to the pixel vignetting problem. [pdf]
  3. T. Chen, P. B. Catrysse, A. El Gamal, and B. A. Wandell, "How Small Should Pixel Size be?," Proc. SPIE Int. Soc. Opt. Eng. 3965, 451, 2000. (Cited 126 times) [pdf]
    Abstract: Pixel design is a key part of image sensor design. After deciding on pixel architecture, a fundamental tradeoff is made to select pixel size. A small pixel size is desirable because it results in a smaller die size and/or higher spatial resolution; a large pixel size is desirable because it results in higher dynamic range and signal-to-noise ratio. Given these two ways to improve image quality and given a set of process and imaging constraints an optimal pixel size exists. It is difficult, however, to analytically determine the optimal pixel size, because the choice depends on many factors, including the sensor parameters, imaging optics and the human perception of image quality. This paper describes a methodology, using a camera simulator and image quality metrics, for determining the optimal pixel size. The methodology is demonstrated for APS implemented in CMOS processes down to 0.18-μm technology. For a typical 0.35-μm CMOS technology the optimal pixel size is found to be approximately 6.5 μm at fill factor of 30%. It is shown that the optimal pixel size scales with technology, but at slower rate than the technology itself. [pdf]

1999

  1. (Invited) B. A. Wandell, P. B. Catrysse, J. M. DiCarlo, D. X. D. Yang, and A. El Gamal, "Multiple Capture Single Image Architecture with a CMOS Sensor," Proceedings of the International Symposium on Multispectral Imaging and Color Reproduction for Digital Archives, 11, 1999. (Cited 42 times)
  2. P. B. Catrysse, A. El Gamal, and B. A. Wandell, "Comparative analysis of color architectures for image sensors," Proc. SPIE Int. Soc. Opt. Eng. 3650, 26, 1999. (Cited 28 times) [pdf]
    Abstract: We have developed a software simulator to create physical models of a scene, compute camera responses, render the camera images and to measure the perceptual color errors (CIELAB) between the scene and rendered images. The simulator can be used to measure color reproduction errors and analyze the contributions of different sources to the error. We compare three color architectures for digital cameras: (a) a sensor array containing three interleaved color mosaics, (b) an architecture using dichroic prisms to create three spatially separated copies of the image, (c) a single sensor array coupled with a time-varying color filter measuring three images sequentially in time. Here, we analyze the color accuracy of several exposure control methods applied to these architectures. The first exposure control algorithm (traditional) simply stops image acquisition when one channel reaches saturation. In a second scheme, we determine the optimal exposure time for each color channel separately, resulting in a longer total exposure time. In a third scheme we restrict the total exposure duration to that of the first scheme, but we preserve the optimum ratio between color channels. Simulator analyses measure the color reproduction quality of these different exposure control methods as a function of illumination taking into account photon and sensor noise, quantization and color conversion errors. [pdf]

1996

  1. P. B. Catrysse, M. C. Bashaw, J. F. Heanue, and L. Hesselink, "Phase-conditioning techniques for leveling of the reference beam intensity in orthogonal phase-encoded multiplexing for holographic data storage," Technical Digest Int. Symp. on Optical Memory and Optical Data Storage ’96, 1996.
  2. D. Lande, J. F. Heanue, P. B. Catrysse, M. C. Bashaw, and L. Hesselink, "Digital wavelength-multiplexed holographic data storage system," Proc. CLEO ’96, 142, 1996. (Cited 57 times)

1994

  1. Y. Verbandt, P. Catrysse, H. Thienpont, I. Veretennicoff, P. Geerlings, and G. L. J. A. Rikken, "Resonant tunneling and the optical response of conjugated molecules," Proc. Symp. on Advanced Materials for Molecular Electronics and Photonics '94, 1, 1994. (Cited 45 times)
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